Author Archives: Brian Ruether

Microfocus technology is required to achieve the resolution necessary for inspecting today’s most challenging components.   With the advent of additive manufacturing in production and the ever-increasing need to manufacture smaller and lighter components, the need to inspect for small defects while maintaining throughput is becoming increasingly important.  Inspecting for smaller defects and maintaining throughput […]

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Posted in: Brian Ruether

Take a CPAP mask for example – it seems pretty basic in appearance…  However, when it comes to assessing a CPAP mask from a measurement perspective – it proves to be very complex. In metrology, traditional measurement tools such as CMMs and Laser Scanners, are simply ineffective. Neither can successfully measure flexible, transparent, and/or complex objects.  Since CMM relies on a touch probe contacting the surface, consequently it will deform the object producing erroneous results. Further more, CMM also has […]

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Posted in: Brian Ruether